Microwave Plasma CVD Systems for Gem Diamond Production

Microwave plasma CVD systems

KODKO is leading manufacture of Microwave Plasma CVD Systems for diamond research and production in China. Upon CSU's advanced R&D and excellent reputation in scientificcommunity.

Highly reliable system,Unique process flexibility,repeatability and vacuum integrity provide the highest quality diamond Color & Clarity and highest growth rates availale for the most deamanding R&D and production. At same time, we also provide a very wide range of standard and custom system and process solutions for users.

6 KW System ZK-M0200

Microwave Generator
6 kW SAIREM micro-wave generator (switch mode power supply)

2.45GHz Magnetron mirco-wave frequency
Circulator and isolator

Auto operated EH-tuning element

Plasma Source

6" plasma source ,excitation frequemcy 2.45GHz

Capable of operating in Low to High Power Density Plasma
Unique capabilities of temperature control at high power densities

Gas inlet into chamber from down side

Bias electrode

Substrate Holder

Exchangeable substrate holder with:
cooling element (appox D60mm)

Exchangeable holder plate for easy cleaning and maintenance

Molybdenum plasma contacting parts

Automatic height adjustment during growth

Charmber

Clamshell lid for easy-access substrate placement and cleaning

Water cooled Aulumium alloy structure

Gas Management System

5 gas lines including 5 mass flow controllers (addition on request)

Japan Horiba MFC system
Pressure controller range: 100-300mbar

Vacumm

Turbo molecular pump+dry primary pump (UK EDWAROS)

CVD Controller

Computer controller recipe driven operation

Remote control,Detection,system upgrade

Substrate Camera (Optional)

Pyrometer range: 400-1700ºC

Growth Data

10 KW System ZK-M0500

Microwave Generator

10 kW SAIREM micro-wave generator (switch mode power supply)

2.45GHz Magnetron mirco-wave frequency
Circulator and isolator

Auto operated EH-tuning element

Plasma Source

6" plasma source ,excitation frequemcy 2.45GHz

Capable of operating in Low to High Power Density Plasma

Unique capabilities of temperature control at high power densities

Gas inlet into chamber from down side

Bias electrode

Substrate Holder

Exchangeable substrate holder with:

cooling element (appox D75mm)

Exchangeable holder plate for easy cleaning and maintenance

Molybdenum plasma contacting parts

Automatic height adjustment during growth

Charmber

Clamshell lid for easy-access substrate placement and cleaning

Water cooled Aulumium alloy structure

Gas Management System

5 gas lines including 5 mass flow controllers (addition on request)

Japan Horiba MFC system

Pressure controller range: 100-300mbar

Vacumm

Turbo molecular pump+dry primary pump (UK EDWAROS)

CVD Controller

Computer controller recipe driven operation

Remote control,Detection,system upgrade

Substrate Camera (Optional)

Pyrometer range: 400-1700ºC

Growth Data